A method for applying a polymeric resist coating of very high molecular weight to a suitable substrate without the necessity of elaborate purification steps and for ensuring adequate coverage of raised regions in three-dimensionally patterned substrates. The method comprises exposing the substrate to be coated to the vapor of an anionically polymerizable monomer of the formula: CHR=CXY where X and Y are strong electron withdrawing groups R si H or, provided that X and Y are both -CN,C1-C4 alkyl for sufficient time to deposit a polymerizable coating thereon.